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英國Nanobean NB5 電子束光刻機

具有良好的穩(wěn)定性，平均正常運行時間超過93%

規(guī)格:

束流電壓范圍為: 20kV - 100kV

光刻膠的特征尺寸: <8nm (光刻精度)

500um區(qū)域拼接/疊加誤差: 小于25nm

自動裝載5卡盤氣鎖系統
 

NB5發(fā)展目標:

改進設計和組件以減少日常服務需求。

實現每年少于5%的機器故障停機時間。

提高性能

便于批量生產。

NB5系統將為進一步發(fā)展高偏轉速度和進一步集成電子提供平臺。
 

The nB4 is a generation ahead of the current competition and with its field-proven performance has gained acceptance in the market place. It has excellent stability and has demonstrated an average uptime of greater than 93%. NanoBeam now introduces the nB5 which has been developed to further reduce delivery times and service costs.

NB5 development aims:

Refine design and components to reduce routine service requirements.
Achieve a machine-fault-downtime of less than 5% annually.
Enhance performance
Facilitate volume production.
Specification:

Beam Voltage range        20kV - 100kV
Feature size on resist      <8nm
Stitching/overlay error    <25nm for 500um field
Automatic loading            5 chuck airlock system

The nB5 system will provide a platform for further development to high deflection speed and further integrated electronics.